Archive for Clean Room Particle Counter

Airborne Molecular Contamination Monitoring and Control

CleanroomAirborne molecular contamination (AMC) can be damaging to a product or process, making it essential to monitor and control. AMC is chemical contamination in the form of vapors or aerosols that can be organic or inorganic, and it includes everything from acids and bases to organometallic compounds and dopants.

These chemical vapors can result from a wide range of sources, including cleanroom materials, make-up air, process chemicals, operating personnel, cooling systems and even the outgassing of certain aging materials.

Pollution There are primarily two types of AMC: internal and external. Internal sources of AMC involve process chemicals, accidental chemical spills, operating personnel and off-gassing cleanroom construction materials like floor tiles, walls and sealants. External sources include factory emissions, automobile exhaust emissions and farm lands. The entry point of external sources of AMC, incidentally, is generally the fab through the make-up air handling system.

Evaluating Gases

cleanroom monitoringWhen addressing AMC, it’s essential to consider what type of gasses affect the process and at what level. It’s also important to keep in mind that there is no “universal” AMC sensor for monitoring. AMC monitoring is not like particle counting where you can assume your product will be impacted by all AMC. Ideally, you should identify the types of chemicals that your products are most sensitive to, as well as their possible sources.

Ammonia contamination can be a serious threat. One of the most sensitive steps in the semiconductor manufacturing is photolithography. The technology has indicated increased sensitivity to basic contamination, with ammonia being identified as the dominant basic substance among AMC.

The target control levels for ammonia and other AMC contaminations inside the process tool environment are under ~1 ppb. And as device geometries shrink in scale, the need for accurate ongoing monitoring of AMC levels in semiconductor manufacturing environments intensifies.

AMC monitoring and control is equally as important as particle contamination, but even harder to identify. In fact, the level of basic impurities in the air can be critical at very low concentrations down to ppb levels and lower. For example, wafers exposed to ammonia can lead to structural defects, such as incorrect imprinted line width, short-circuits, metal corrosion and hazing on the wafers and optics—all of which could cause component failure. Ammonia contamination—which is difficult and expensive to fight—has many sources within cleanrooms, including personnel and several production processes.

photolithography Fortunately, most leading-edge semiconductor companies engage in “real-time” AMC monitoring to address the issue. Traditionally centered on the photolithographic area, monitoring coverage is now taking place in other process locations. To enhance your understanding of AMC monitoring, here are some common questions and answers about the topic:

My lab already tests for AMC, so why should I use a monitoring system? Most labs conduct static testing, so the data generally can only show an average concentration level. However, online monitoring shows AMC levels in real time, and can indicated whether concentration is at a normal background level or is a specific contamination event. It can also show where the low and high phases are in the daily cycle.

What compounds are monitored? Monitoring can be done for many types of compounds, including ammonia, NMP, and total amines acids and sulfur.

What are the minimum detection limits? The minimum limits will depend on the type of chemicals and technology involved. You must determine the appropriate minimum detection limits based on the requirements for your specific process.

What is required for system maintenance? The sampling system requires very little maintenance, as the vacuum pumps need only to be maintained quarterly. However, maintenance requirements for the analyzers will depend on the type of analyzer and gases being monitored. Additionally, different analyzers will have different calibration requirements, which, in turn, depend on your desired accuracy of the sensor.

Where should the sample points be installed? Installation should be as close to critical processes as possible without interfering with the processes. Typically, points are installed inside and outside of a process, as well as up and down stream from the chemical filters.

How much does a system like this cost? The cost depends on the chemicals being monitored and the number of locations being sampled. Prices range from $3,000 for a single sensor to $400,000 for an entire system sampling multiple locations.

Why should I continuously monitor AMC? Ongoing monitoring is essential to ensuring that a facility is performing properly and can alert personnel when an incident happens. As a result, responses to contamination incidents can be carried out immediately instead of days or weeks.

What sensors are recommended? Sensors should be used according to the application. When choosing a sensor, consideration should be given to the following: target chemical, detection limits, dynamic range, response time, zero and span drift, potential interference, portable or online use, heat-up times, calibration method and frequency and operation cost.

cleanroom monitoring systemCan I send data to our existing data management system? Yes. The manifold reads the data from multiple sensors, but provides all data via a single interface using industry-standard Modbus protocol.

Do the instruments contain radioactive materials? Some instruments do use a radioactive source to ionize the sample. Be sure to address this question with each instrument supplier.

How long can the tubing runs be from manifold to sample point? The runs can be as long as you wish. However, the chance of contaminating or diluting the sample increases with longer distances. We recommend not running sample tubing any longer than 80 meters or at least using a booster pump for longer distances.

What materials are used for tubing? Teflon is the most commonly used material. Stainless steel can also be used, but it is generally more costly and less compatible with a variety of chemicals.

How frequently should sensors be calibrated? The frequency should be based on zero drift of the sensor per day (the drift the sensor will experience from zero in a set time, normally a day or week); the span drift (drift experienced from a fixed concentration amount over a day or week); and the level of detection desired. (The lower the level, the more often you will need to calibrate to keep the zero and span drift from exceeding your minimum detection limit.)

semiconductorWhat processes do you recommend monitoring? This will be determined by the type of manufacturing process you have. For example, the semiconductor industry generally involves photolithography, metals, etch, copper process areas and photomask manufacturing. Hard disk drive manufacturing typically includes wafer operations, HGA/HSA operations, final drive assembly and media.

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Cleanroom Particle Counter

If you have any questions or would like to discuss details about cleanroom particle counters, ISO or Fed 209e standards or anything related, please click the “Comments” link below to make a post. Posts are moderated and will be published and answered in one or two days in most cases.

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FED-STD-209E Replaced by ISO 14644

On November 29, 2001 the U.S. General Services Administration (GSA) issued a notice of cancellation for the Federal Standard 209E (FED-STD-209E). This notice is basically stating that the standard will no longer be revised, though about 60% of U.S. companies are still designing their cleanroom to the old standard.

The decision was based on the recommendation of the IEST, who assisted in developing the standard. The IEST recommended the International Standard ISO 14644 be used as a standard for cleanrooms and set the guidelines for the global contamination control community. In 1999 the document was submitted as an American National Standard and has since been adopted as ANSI/IEST/ISO 14644-1.

ISO 14644 consists of 8 documents that take into consideration all aspects of design, specifications and control of cleanrooms, clean hoods and other associated environmentally controlled “clean” environments in all three possible states, as-built, at-rest and operational. The ISO 14644 standards are more appropriate for the sensitive processes found in the aerospace, microelectronics and pharmaceutical industries and is a true international standard that governs all aspects regarding cleanroom design, operation, monitoring and testing procedures.

To give a general overview of the 8 documents that make up the ISO 14644 I have briefly described each section of the ISO 14644 below:

ISO 14644-1 is an 18 page document that specifies the classifications of air cleanliness for cleanrooms, hoods, zones and other associated environments.

ISO 14644-2 is a 7 page document that specifies the monitoring and testing procedures to prove continued compliance with ISO 14644-1.

ISO 14644-3 is a 65 page document covering testing procedures for cleanrooms and clean hoods/zones (unidirectional and non-laminar) in all three states (as-built, at-rest and operational)

ISO 14644-4 is a 51 page documents that details the design and construction issues for new start-up cleanrooms.

ISO 14644-5 is a 44 page document that specifies the requirements for general cleanroom operations. This document covers all classes of cleanrooms and is intended as a general guide, which does not get into the specifics of any applications or testing or monitoring procedures.

ISO 14644-6 is a 21 page document that defines the vocabulary used in the ISO 14644 documents

ISO 14644-7 is a 52 page document that specifies the minimum requirements for the design, construction, installation, test and approval of separative devices such as clean air hoods, gloveboxes, isolators and mini-environments.

ISO 14644-8 is an 18 page document that covers the classification of airborne molecular contamination (AMC) in cleanrooms and associated controlled environments under operational conditions for applications where contamination is a risk to the product or process. ISO 14644-8 includes testing procedures, analysis and time weighted factors within the specification for classification.

Two additional documents, ISO 14698, parts 1 & 2, were released in September of 2003. Part 1 deals with the general principles and methods of biocontamination control, and part 2 explains the evaluation and interpretation of biocontamination data.

If anyone has any comments or questions regarding the ISO 14644 standards, classifications or any other related topic, click the comments link below to join in the ongoing discussion.

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