Airborne Molecular Contamination Monitoring and Control

CleanroomAirborne molecular contamination (AMC) can be damaging to a product or process, making it essential to monitor and control. AMC is chemical contamination in the form of vapors or aerosols that can be organic or inorganic, and it includes everything from acids and bases to organometallic compounds and dopants.

These chemical vapors can result from a wide range of sources, including cleanroom materials, make-up air, process chemicals, operating personnel, cooling systems and even the outgassing of certain aging materials.

Pollution There are primarily two types of AMC: internal and external. Internal sources of AMC involve process chemicals, accidental chemical spills, operating personnel and off-gassing cleanroom construction materials like floor tiles, walls and sealants. External sources include factory emissions, automobile exhaust emissions and farm lands. The entry point of external sources of AMC, incidentally, is generally the fab through the make-up air handling system.

Evaluating Gases

cleanroom monitoringWhen addressing AMC, it’s essential to consider what type of gasses affect the process and at what level. It’s also important to keep in mind that there is no “universal” AMC sensor for monitoring. AMC monitoring is not like particle counting where you can assume your product will be impacted by all AMC. Ideally, you should identify the types of chemicals that your products are most sensitive to, as well as their possible sources.

Ammonia contamination can be a serious threat. One of the most sensitive steps in the semiconductor manufacturing is photolithography. The technology has indicated increased sensitivity to basic contamination, with ammonia being identified as the dominant basic substance among AMC.

The target control levels for ammonia and other AMC contaminations inside the process tool environment are under ~1 ppb. And as device geometries shrink in scale, the need for accurate ongoing monitoring of AMC levels in semiconductor manufacturing environments intensifies.

AMC monitoring and control is equally as important as particle contamination, but even harder to identify. In fact, the level of basic impurities in the air can be critical at very low concentrations down to ppb levels and lower. For example, wafers exposed to ammonia can lead to structural defects, such as incorrect imprinted line width, short-circuits, metal corrosion and hazing on the wafers and optics—all of which could cause component failure. Ammonia contamination—which is difficult and expensive to fight—has many sources within cleanrooms, including personnel and several production processes.

photolithography Fortunately, most leading-edge semiconductor companies engage in “real-time” AMC monitoring to address the issue. Traditionally centered on the photolithographic area, monitoring coverage is now taking place in other process locations. To enhance your understanding of AMC monitoring, here are some common questions and answers about the topic:

My lab already tests for AMC, so why should I use a monitoring system? Most labs conduct static testing, so the data generally can only show an average concentration level. However, online monitoring shows AMC levels in real time, and can indicated whether concentration is at a normal background level or is a specific contamination event. It can also show where the low and high phases are in the daily cycle.

What compounds are monitored? Monitoring can be done for many types of compounds, including ammonia, NMP, and total amines acids and sulfur.

What are the minimum detection limits? The minimum limits will depend on the type of chemicals and technology involved. You must determine the appropriate minimum detection limits based on the requirements for your specific process.

What is required for system maintenance? The sampling system requires very little maintenance, as the vacuum pumps need only to be maintained quarterly. However, maintenance requirements for the analyzers will depend on the type of analyzer and gases being monitored. Additionally, different analyzers will have different calibration requirements, which, in turn, depend on your desired accuracy of the sensor.

Where should the sample points be installed? Installation should be as close to critical processes as possible without interfering with the processes. Typically, points are installed inside and outside of a process, as well as up and down stream from the chemical filters.

How much does a system like this cost? The cost depends on the chemicals being monitored and the number of locations being sampled. Prices range from $3,000 for a single sensor to $400,000 for an entire system sampling multiple locations.

Why should I continuously monitor AMC? Ongoing monitoring is essential to ensuring that a facility is performing properly and can alert personnel when an incident happens. As a result, responses to contamination incidents can be carried out immediately instead of days or weeks.

What sensors are recommended? Sensors should be used according to the application. When choosing a sensor, consideration should be given to the following: target chemical, detection limits, dynamic range, response time, zero and span drift, potential interference, portable or online use, heat-up times, calibration method and frequency and operation cost.

cleanroom monitoring systemCan I send data to our existing data management system? Yes. The manifold reads the data from multiple sensors, but provides all data via a single interface using industry-standard Modbus protocol.

Do the instruments contain radioactive materials? Some instruments do use a radioactive source to ionize the sample. Be sure to address this question with each instrument supplier.

How long can the tubing runs be from manifold to sample point? The runs can be as long as you wish. However, the chance of contaminating or diluting the sample increases with longer distances. We recommend not running sample tubing any longer than 80 meters or at least using a booster pump for longer distances.

What materials are used for tubing? Teflon is the most commonly used material. Stainless steel can also be used, but it is generally more costly and less compatible with a variety of chemicals.

How frequently should sensors be calibrated? The frequency should be based on zero drift of the sensor per day (the drift the sensor will experience from zero in a set time, normally a day or week); the span drift (drift experienced from a fixed concentration amount over a day or week); and the level of detection desired. (The lower the level, the more often you will need to calibrate to keep the zero and span drift from exceeding your minimum detection limit.)

semiconductorWhat processes do you recommend monitoring? This will be determined by the type of manufacturing process you have. For example, the semiconductor industry generally involves photolithography, metals, etch, copper process areas and photomask manufacturing. Hard disk drive manufacturing typically includes wafer operations, HGA/HSA operations, final drive assembly and media.

If you have additional questions or feedback on this topic, please click on the comments button below or call us at 1-877-688-2703

3 Comments »

  1. Particle Counter Blog » Difference Between Cleanroom Certification and Monitoring Said,

    May 8, 2006 @ 11:05 am

    […] ISO 14644-2 also dictates that cleanroom particle classifications in areas cleaner than ISO class 5 require a time interval of at least six months between demonstrations of adherence to ISO 14644-1. And any areas that are less clean than ISO Class 5 require a 12-month maximum interval between displays of compliance. […]

  2. Emmett O'Brien Said,

    June 20, 2006 @ 5:28 pm

    Dear Sir,
    I am connected with the Aviation Industry and I have had an inquiry to periodically monitor the “airborne lead” levels over a city. Can you supply me with the necessary airborne sampling sensors and priovide me with test monitoring results.

    Also there has been an inquiry to provide “radioactive airborne” sampling over a nuclear reactor.

    I would appreciate any assistance as I know nothing of these processes.

    Your’s Sincerely,
    EMMETT O’BRIEN

  3. Rod Said,

    July 5, 2006 @ 2:33 pm

    Emmett,

    Thanks for taking the time to post on our blog. If you are wanting to measure airborne lead particles, you will probably not want to use a laser particle counter due to the fact that it will only count particles and has no way of determining the substance of the particles.

    You can however detect lead particle by either gathering samples on a filter media and sending samples to an ELLAP (Environmental Lead Laboratory Accreditation Program) lab to determine if lead is present or to use a portable x-ray fluorescence (XRF) machine. I would suggest reading some of the following articles that pertain to airborne testing for lead and other toxic metals.

    Practicality of Using air Lead Measurements by Portable X-Ray Fluorescence to Manage Worker Protection Programs

    Emerging Portable X-ray Fluorescence Technology for Measuring Multiple Airborne Metals: An Evaluation of A Battery Powered X-Ray Tube Instrument


    History of XRF - Timeline of X-ray Physics and X-ray Spectrometry (1951 - present)

     
    As for radioactive particles, if you simply wanted to measure particle that you know are radioactive and know the quantity and size, you can use a particle counter (nobody will accept it back for service though). Keep in mind that no particle counter will tell you if the particles are radioactive or not. You may be better off sampling the particles into a filter and then measuring for radioactive contamination.

    SEE: Analytical Techniques for Environmental Particles
    I hope this information helps. If you have any questions, please feel free to post them here. We also invite others to join in this discussion.

RSS feed for comments on this post · TrackBack URI

Leave a Comment

You must be logged in to post a comment.

Close Call 1-877-688-2703